Abstract
The intrinsic computational efficiency (ICE) of silicon defines the upper limit of the amount of computation within a given technology and power envelope. The effective computational efficiency (ECE) and the effective computational density (ECD) of silicon, by taking computation, memory and communication into account, offer a more realistic upper bound for computation of a given technology. Among other factors, they consider how distributed the memory is, how much area is occupied by computation, memory and interconnect, and the geometric properties of 3-D stacked technology with through silicon vias (TSV) as vertical links. We use the ECE and ECD to study the limits of performance under different memory distribution, power, thermal and cost constraints for various 2-D and 3-D topologies, in current and future technology nodes.
| Original language | Undefined/Unknown |
|---|---|
| Title of host publication | Proc. IEEE/IFIP International Conference on VLSI and System-on-Chip (VLSI-SoC) |
| Pages | 343-348 |
| Number of pages | 6 |
| DOIs | |
| Publication status | Published - 1 Oct 2011 |
Bibliographical note
Invited Presentation, Special Session on Frontier in 3-D Integrated Engineering, Hong KongResearch Groups and Themes
- Photonics and Quantum
Keywords
- power semiconductor devices
- three-dimensional integrated circuits
- 3D integration
- effective computational density
- effective computational efficiency
- intrinsic computational efficiency
- power envelope
- silicon computation
- through silicon vias
- vertical links
- Computational modeling
- Heating
- Random access memory