An electrochemical and ellipsometric study of oxide growth on silicon during anodic etching in fluoride solutions

M Bailes, S Bohm, LM Peter, DJ Riley, R Greef

    Research output: Contribution to journalArticle (Academic Journal)peer-review

    24 Citations (Scopus)
    Translated title of the contributionAn electrochemical and ellipsometric study of oxide growth on silicon during anodic etching in fluoride solutions
    Original languageEnglish
    Pages (from-to)1757 - 1772
    JournalElectrochimica Acta
    Volume43
    Publication statusPublished - 1998

    Cite this