An electrochemical and ellipsometric study of oxide growth on silicon during anodic etching in fluoride solutions

M Bailes, S Bohm, LM Peter, DJ Riley, R Greef

    Research output: Contribution to journalArticle (Academic Journal)

    24 Citations (Scopus)
    Translated title of the contributionAn electrochemical and ellipsometric study of oxide growth on silicon during anodic etching in fluoride solutions
    Original languageEnglish
    Pages (from-to)1757 - 1772
    JournalElectrochimica Acta
    Volume43
    Publication statusPublished - 1998

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