An electrochemical and ellipsometric study of oxide growth on silicon during anodic etching in fluoride solutions

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Translated title of the contribution	An electrochemical and ellipsometric study of oxide growth on silicon during anodic etching in fluoride solutions
Original language	English
Pages (from-to)	1757 - 1772
Journal	Electrochimica Acta
Volume	43
Publication status	Published - 1998

Handle.net

@article{d63847f44de44a03b253e860091bfbcc,

title = "An electrochemical and ellipsometric study of oxide growth on silicon during anodic etching in fluoride solutions",

author = "M Bailes and S Bohm and LM Peter and DJ Riley and R Greef",

year = "1998",

language = "English",

volume = "43",

pages = "1757 -- 1772",

journal = "Electrochimica Acta",

publisher = "Elsevier Limited",

}