Translated title of the contribution | Anomalous scaling of the surface width during Cu electrodeposition |
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Original language | English |
Pages (from-to) | 256 - 259 |
Number of pages | 4 |
Journal | Physical Review Letters |
Volume | 86 (2) |
DOIs | |
Publication status | Published - 8 Jan 2001 |
Anomalous scaling of the surface width during Cu electrodeposition
S Huo, W Schwarzacher
Research output: Contribution to journal › Article (Academic Journal) › peer-review
137
Citations
(Scopus)