Anomalous scaling of the surface width during Cu electrodeposition

S Huo, W Schwarzacher

Research output: Contribution to journalArticle (Academic Journal)peer-review

137 Citations (Scopus)
Translated title of the contributionAnomalous scaling of the surface width during Cu electrodeposition
Original languageEnglish
Pages (from-to)256 - 259
Number of pages4
JournalPhysical Review Letters
Volume86 (2)
DOIs
Publication statusPublished - 8 Jan 2001

Bibliographical note

Publisher: American Physical Society

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