Anomalous scaling of the surface width during Cu electrodeposition

Research output: Contribution to journal › Article (Academic Journal) › peer-review

141 Citations (Scopus)

Translated title of the contribution	Anomalous scaling of the surface width during Cu electrodeposition
Original language	English
Pages (from-to)	256 - 259
Number of pages	4
Journal	Physical Review Letters
Volume	86 (2)
DOIs	https://doi.org/10.1103/PhysRevLett.86.256
Publication status	Published - 8 Jan 2001

Publisher: American Physical Society

Access to Document

@article{e6bebd3e502341f099ba6a0ef1de2c1e,

title = "Anomalous scaling of the surface width during Cu electrodeposition",

author = "S Huo and W Schwarzacher",

note = "Publisher: American Physical Society",

year = "2001",

month = jan,

day = "8",

doi = "10.1103/PhysRevLett.86.256",

language = "English",

volume = "86 (2)",

pages = "256 -- 259",

journal = "Physical Review Letters",

issn = "1079-7114",

publisher = "American Physical Society (APS)",

}

TY - JOUR

T1 - Anomalous scaling of the surface width during Cu electrodeposition

AU - Huo, S

AU - Schwarzacher, W

N1 - Publisher: American Physical Society

PY - 2001/1/8

Y1 - 2001/1/8

U2 - 10.1103/PhysRevLett.86.256

DO - 10.1103/PhysRevLett.86.256

M3 - Article (Academic Journal)

SN - 1079-7114

VL - 86 (2)

SP - 256

EP - 259

JO - Physical Review Letters

JF - Physical Review Letters

ER -