Atomic layer deposited α-Ga2O3 solar-blind photodetectors

Manikant Singh, Serge Karboyan, Martin H H Kuball

Research output: Contribution to journalArticle (Academic Journal)peer-review

10 Citations (Scopus)


Low temperature atomic layer deposition was used to deposit α-Ga2O3 films, which were subsequently annealed at various temperatures and atmospheres. The α-Ga2O3 phase is stable up to 400 oC, which is also the temperature that yields the most intense and sharpest reflection by X-ray diffraction. Upon annealing at 450 oC and above, the material gradually turns into the more
thermodynamically stable ε or β phase. The suitability of the materials for solar-blind photodetector applications has been demonstrated with the best responsivity achieved being 1.2 A/W under 240 nm illumination and 10 V bias, for the sample annealed at 400 oC in argon. It is worth noting however
that the device performance strongly depends on the annealing conditions, with the device annealed in forming gas behaving poorly. Given that the tested devices have similar microstructure, the discrepancies in device performance are attributed to hydrogen impurities.
Original languageEnglish
JournalJournal of Physics D: Applied Physics
Issue number47
Early online date15 Aug 2019
Publication statusPublished - 6 Sep 2019

Structured keywords

  • CDTR

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