Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications

A. M. Adamska; E. Lawrence Bright; J. Sutcliffe; W. Liu; O. D. Payton; L. Picco; T. B. Scott

doi:10.1016/j.tsf.2015.11.030

Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications

A. M. Adamska^*, E. Lawrence Bright, J. Sutcliffe, W. Liu, O. D. Payton, L. Picco, T. B. Scott

^*Corresponding author for this work

Research output: Contribution to journal › Article (Academic Journal) › peer-review

15 Citations (Scopus)

Abstract

Polycrystalline uranium dioxide thin films were grown on nickel substrates via aqueous electrodeposition of a precursor uranyl salt. The arising semiconducting uranium dioxide thin films exhibited a tower-like morphology, which may be suitable for future application in 3D solar cell applications. The thickness of the homogenous, tower-like films reached 350 nm. Longer deposition times led to the formation of thicker (up to 1.5 μm) and highly porous films.

Original language	English
Pages (from-to)	57-64
Number of pages	8
Journal	Thin Solid Films
Volume	597
DOIs	https://doi.org/10.1016/j.tsf.2015.11.030
Publication status	Published - 31 Dec 2015

Research Groups and Themes

Engineering Mathematics Research Group

Keywords

Electrodeposition
Focused ion beam
High-speed atomic force microscopy
Scanning electron microscopy
Secondary ion mass spectrometry
Thin films
Uranium oxides
X-ray diffraction

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10.1016/j.tsf.2015.11.030

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@article{6718fe48276a448ca76cce865a6a1d51,

title = "Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications",

abstract = "Polycrystalline uranium dioxide thin films were grown on nickel substrates via aqueous electrodeposition of a precursor uranyl salt. The arising semiconducting uranium dioxide thin films exhibited a tower-like morphology, which may be suitable for future application in 3D solar cell applications. The thickness of the homogenous, tower-like films reached 350 nm. Longer deposition times led to the formation of thicker (up to 1.5 μm) and highly porous films.",

keywords = "Electrodeposition, Focused ion beam, High-speed atomic force microscopy, Scanning electron microscopy, Secondary ion mass spectrometry, Thin films, Uranium oxides, X-ray diffraction",

author = "Adamska, {A. M.} and {Lawrence Bright}, E. and J. Sutcliffe and W. Liu and Payton, {O. D.} and L. Picco and Scott, {T. B.}",

year = "2015",

month = dec,

day = "31",

doi = "10.1016/j.tsf.2015.11.030",

language = "English",

volume = "597",

pages = "57--64",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Amsterdam:Elsevier",

}

TY - JOUR

T1 - Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications

AU - Adamska, A. M.

AU - Lawrence Bright, E.

AU - Sutcliffe, J.

AU - Liu, W.

AU - Payton, O. D.

AU - Picco, L.

AU - Scott, T. B.

PY - 2015/12/31

Y1 - 2015/12/31

N2 - Polycrystalline uranium dioxide thin films were grown on nickel substrates via aqueous electrodeposition of a precursor uranyl salt. The arising semiconducting uranium dioxide thin films exhibited a tower-like morphology, which may be suitable for future application in 3D solar cell applications. The thickness of the homogenous, tower-like films reached 350 nm. Longer deposition times led to the formation of thicker (up to 1.5 μm) and highly porous films.

AB - Polycrystalline uranium dioxide thin films were grown on nickel substrates via aqueous electrodeposition of a precursor uranyl salt. The arising semiconducting uranium dioxide thin films exhibited a tower-like morphology, which may be suitable for future application in 3D solar cell applications. The thickness of the homogenous, tower-like films reached 350 nm. Longer deposition times led to the formation of thicker (up to 1.5 μm) and highly porous films.

KW - Electrodeposition

KW - Focused ion beam

KW - High-speed atomic force microscopy

KW - Scanning electron microscopy

KW - Secondary ion mass spectrometry

KW - Thin films

KW - Uranium oxides

KW - X-ray diffraction

UR - http://www.scopus.com/inward/record.url?scp=84959551113&partnerID=8YFLogxK

U2 - 10.1016/j.tsf.2015.11.030

DO - 10.1016/j.tsf.2015.11.030

M3 - Article (Academic Journal)

AN - SCOPUS:84959551113

SN - 0040-6090

VL - 597

SP - 57

EP - 64

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications

Abstract

Research Groups and Themes

Keywords

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Ionic solutions of two-dimensional materials

NERC Big Data Capital Call 2013

Cite this

Characterisation of electrodeposited polycrystalline uranium dioxide thin films on nickel foil for industrial applications

Abstract

Research Groups and Themes

Keywords

Access to Document

Handle.net

Other files and links

Fingerprint

Research output

Ionic solutions of two-dimensional materials

Projects

NERC Big Data Capital Call 2013

Cite this