Characterization of plasma-deposited amorphous hydrogenated carbon films by neutron reflectivity

M. J. Grundy*, R. M. Richardson, S. J. Roser, G. Beamson, W. J. Brennan, J. Howard, M. O'Neil, J. Penfold, C. Shackleton, R. C. Ward

*Corresponding author for this work

Research output: Contribution to journalArticle (Academic Journal)peer-review

12 Citations (Scopus)

Abstract

Thin films (less than 2000 Å) of amorphous hydrogenated carbon have been characterized by neutron reflectivity measurements. Films were deposited onto silicon substrates from a methane r.f. plasma to produce both very hard and very soft materials. The critical angle and density give the film composition (CH0.55±0.05 hard film, CH0.78±0.08 soft film). Fitting the interference pattern to a model gives the film thickness and a measure of the extent of mixing at the silicon-carbon interface. A structural model for plasma-deposited carbon films is used to correlate film composition with plasma deposition conditions and optical band gap measurements.

Original languageEnglish
Pages (from-to)269-282
Number of pages14
JournalThin Solid Films
Volume172
Issue number2
DOIs
Publication statusPublished - 15 May 1989

Fingerprint

Dive into the research topics of 'Characterization of plasma-deposited amorphous hydrogenated carbon films by neutron reflectivity'. Together they form a unique fingerprint.

Cite this