Characterization of plasma-deposited amorphous hydrogenated carbon films by neutron reflectivity

M. J. Grundy; R. M. Richardson; S. J. Roser; G. Beamson; W. J. Brennan; J. Howard; M. O'Neil; J. Penfold; C. Shackleton; R. C. Ward

doi:10.1016/0040-6090(89)90654-8

Characterization of plasma-deposited amorphous hydrogenated carbon films by neutron reflectivity

M. J. Grundy^*, R. M. Richardson, S. J. Roser, G. Beamson, W. J. Brennan, J. Howard, M. O'Neil, J. Penfold, C. Shackleton, R. C. Ward

^*Corresponding author for this work

Interface Analysis Centre

Research output: Contribution to journal › Article (Academic Journal) › peer-review

12 Citations (Scopus)

Abstract

Thin films (less than 2000 Å) of amorphous hydrogenated carbon have been characterized by neutron reflectivity measurements. Films were deposited onto silicon substrates from a methane r.f. plasma to produce both very hard and very soft materials. The critical angle and density give the film composition (CH_0.55±0.05 hard film, CH_0.78±0.08 soft film). Fitting the interference pattern to a model gives the film thickness and a measure of the extent of mixing at the silicon-carbon interface. A structural model for plasma-deposited carbon films is used to correlate film composition with plasma deposition conditions and optical band gap measurements.

Original language	English
Pages (from-to)	269-282
Number of pages	14
Journal	Thin Solid Films
Volume	172
Issue number	2
DOIs	https://doi.org/10.1016/0040-6090(89)90654-8
Publication status	Published - 15 May 1989

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@article{c3e66d24f4e847caa67b0fd0397ff145,

title = "Characterization of plasma-deposited amorphous hydrogenated carbon films by neutron reflectivity",

abstract = "Thin films (less than 2000 {\AA}) of amorphous hydrogenated carbon have been characterized by neutron reflectivity measurements. Films were deposited onto silicon substrates from a methane r.f. plasma to produce both very hard and very soft materials. The critical angle and density give the film composition (CH0.55±0.05 hard film, CH0.78±0.08 soft film). Fitting the interference pattern to a model gives the film thickness and a measure of the extent of mixing at the silicon-carbon interface. A structural model for plasma-deposited carbon films is used to correlate film composition with plasma deposition conditions and optical band gap measurements.",

author = "Grundy, \{M. J.\} and Richardson, \{R. M.\} and Roser, \{S. J.\} and G. Beamson and Brennan, \{W. J.\} and J. Howard and M. O'Neil and J. Penfold and C. Shackleton and Ward, \{R. C.\}",

year = "1989",

month = may,

day = "15",

doi = "10.1016/0040-6090(89)90654-8",

language = "English",

volume = "172",

pages = "269--282",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "2",

}

TY - JOUR

T1 - Characterization of plasma-deposited amorphous hydrogenated carbon films by neutron reflectivity

AU - Grundy, M. J.

AU - Richardson, R. M.

AU - Roser, S. J.

AU - Beamson, G.

AU - Brennan, W. J.

AU - Howard, J.

AU - O'Neil, M.

AU - Penfold, J.

AU - Shackleton, C.

AU - Ward, R. C.

PY - 1989/5/15

Y1 - 1989/5/15

N2 - Thin films (less than 2000 Å) of amorphous hydrogenated carbon have been characterized by neutron reflectivity measurements. Films were deposited onto silicon substrates from a methane r.f. plasma to produce both very hard and very soft materials. The critical angle and density give the film composition (CH0.55±0.05 hard film, CH0.78±0.08 soft film). Fitting the interference pattern to a model gives the film thickness and a measure of the extent of mixing at the silicon-carbon interface. A structural model for plasma-deposited carbon films is used to correlate film composition with plasma deposition conditions and optical band gap measurements.

AB - Thin films (less than 2000 Å) of amorphous hydrogenated carbon have been characterized by neutron reflectivity measurements. Films were deposited onto silicon substrates from a methane r.f. plasma to produce both very hard and very soft materials. The critical angle and density give the film composition (CH0.55±0.05 hard film, CH0.78±0.08 soft film). Fitting the interference pattern to a model gives the film thickness and a measure of the extent of mixing at the silicon-carbon interface. A structural model for plasma-deposited carbon films is used to correlate film composition with plasma deposition conditions and optical band gap measurements.

UR - https://www.scopus.com/pages/publications/0024662513

U2 - 10.1016/0040-6090(89)90654-8

DO - 10.1016/0040-6090(89)90654-8

M3 - Article (Academic Journal)

AN - SCOPUS:0024662513

SN - 0040-6090

VL - 172

SP - 269

EP - 282

JO - Thin Solid Films

JF - Thin Solid Films

IS - 2

ER -

Characterization of plasma-deposited amorphous hydrogenated carbon films by neutron reflectivity

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