Charge trapping and de-trapping in Si-nanoparticles embedded in silicon oxide films

Electrical properties of silicon nanoparticles (Si-np's) embedded in a silicon oxide matrix were studied using MOS-like structures. Si-np's were created after silicon rich oxide (SRO) films were thermally annealed at 1100°C. Capacitance-voltage (C-V) characteristics showed downward and upward peaks in the accumulation region. Current-voltage (I-V) measurements exhibited current valleys and downward and upward peaks. Current versus time (I-t) measurements were also done at a negative constant gate voltage. A switching behaviour between two current states (ON and OFF) was observed. These effects have been related to the charge trapping and de-trapping of the Si-np's embedded in the SRO films.