Translated title of the contribution | Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrate |
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Original language | English |
Pages (from-to) | 4982 - 4985 |
Journal | Angewandte Chemie - International Edition |
DOIs | |
Publication status | Published - 2009 |
Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrate
Research output: Contribution to journal › Article (Academic Journal) › peer-review
41
Citations
(Scopus)