Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrate

L Znag, AJ Patil, L Li, A Schierhorn, S Mann, U Gosele, M Knez

Research output: Contribution to journalArticle (Academic Journal)peer-review

38 Citations (Scopus)
Translated title of the contributionChemical infiltration during atomic layer deposition: metalation of porphyrins as model substrate
Original languageEnglish
Pages (from-to)4982 - 4985
JournalAngewandte Chemie - International Edition
DOIs
Publication statusPublished - 2009

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