Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrate

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Translated title of the contribution	Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrate
Original language	English
Pages (from-to)	4982 - 4985
Journal	Angewandte Chemie - International Edition
DOIs	https://doi.org/10.1002/anie.200900426
Publication status	Published - 2009

Research Groups and Themes

@article{7864ee40fc5749caa83a20d3e4c44f9a,

title = "Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrate",

author = "L Znag and AJ Patil and L Li and A Schierhorn and S Mann and U Gosele and M Knez",

year = "2009",

doi = "10.1002/anie.200900426",

language = "English",

pages = "4982 -- 4985",

journal = "Angewandte Chemie - International Edition",

issn = "1521-3773",

publisher = "John Wiley \& Sons, Ltd.",

}

TY - JOUR

T1 - Chemical infiltration during atomic layer deposition: metalation of porphyrins as model substrate

AU - Znag, L

AU - Patil, AJ

AU - Li, L

AU - Schierhorn, A

AU - Mann, S

AU - Gosele, U

AU - Knez, M

PY - 2009

Y1 - 2009

U2 - 10.1002/anie.200900426

DO - 10.1002/anie.200900426

M3 - Article (Academic Journal)

C2 - 19492376

SN - 1521-3773

SP - 4982

EP - 4985

JO - Angewandte Chemie - International Edition

JF - Angewandte Chemie - International Edition

ER -