Comparison of the effect of boron and nitrogen incorporation on the nucleation behavior and electron-field-emission properties of chemical-vapor-deposited diamond films

K Perng, LH Lee, CF Shih, KS Liu, JW Steeds, GA Evans, I-N Lin

Research output: Contribution to journalArticle (Academic Journal)peer-review

12 Citations (Scopus)
Translated title of the contributionComparison of the effect of boron and nitrogen incorporation on the nucleation behavior and electron-field-emission properties of chemical-vapor-deposited diamond films
Original languageEnglish
Pages (from-to)1277 - 1279
JournalApplied Physics Letters
Volume77
Publication statusPublished - 2000

Bibliographical note

Publisher: American Institute of Physics

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