Abstract
Non-linearities in interferometric displacement measurements commonly affect both homodyne and heterodyne optical interferometers. Unwanted back reflections (ghost reflections) or polarisation leakage introduce non-linearity terms at harmonics of the illuminating wavelength that cannot be fully corrected for with standard non-linearity correction techniques. A two-wavelength interferometric approach, operating at 632.8 and 785 nm, is presented here that
is capable of correcting such non-linearities. Non-linearities are separated from the difference between two displacement measurements made at differing wavelengths with a Fourier approach. Compared to a standard Heydemann ellipse fitting correction, the proposed approach reduces estimated residual non-linearities from 84 to 11 pm in the case of a linear displacement profile. In particular this approach is applicable to the correction of higher order non-linearities that are caused by multiple reflections, and that are therefore very sensitive to alignment conditions.
is capable of correcting such non-linearities. Non-linearities are separated from the difference between two displacement measurements made at differing wavelengths with a Fourier approach. Compared to a standard Heydemann ellipse fitting correction, the proposed approach reduces estimated residual non-linearities from 84 to 11 pm in the case of a linear displacement profile. In particular this approach is applicable to the correction of higher order non-linearities that are caused by multiple reflections, and that are therefore very sensitive to alignment conditions.
| Original language | English |
|---|---|
| Article number | 125202 |
| Pages (from-to) | 1-12 |
| Number of pages | 12 |
| Journal | Measurement Science and Technology |
| Volume | 32 |
| Issue number | 12 |
| DOIs | |
| Publication status | Published - 31 Aug 2021 |
Bibliographical note
Publisher Copyright:© 2021 National Physical Laboratory owned - UK Governmental Body.
Keywords
- interferometry
- non-linearity
- dimensional metrology
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