CVD Diamond and Nanodiamond: Versatile Materials for Countering a Wide Range of CBRN Threats

Research output: Chapter in Book/Report/Conference proceedingConference Contribution (Conference Proceeding)

Abstract

Fabrication of thin films of diamond by chemical vapour deposition (CVD) has now developed into a mature technology, with high-quality diamond readily available from multiple vendors at relatively low cost. As such, scientists and engineers now have access to the wide range of outstanding mechanical, thermal, optical and electronic properties that diamond has to offer. In this review, we shall discuss a range of applications in which CVD diamond films and nanodiamond particles can help to reduce, remove or mitigate the threats from chemical, biological, radiological and nuclear (CBRN) incidents or attacks. Some of these applications are commercially available today, others may require further research or modification of existing diamond-based devices for the unusual requirements of CBRN events, while others are currently only ideas which have yet to be developed.
Original languageEnglish
Title of host publicationNanoscience and Nanotechnology in Security and Protection Against CBRN Threats
EditorsP Petkov, M Achour, Cyril Popov
PublisherSpringer
Publication statusSubmitted - 30 Sep 2019
EventNANOSCIENCE AND NANOTECHNOLOGY IN SECURITY AND PROTECTION AGAINST CBRN THREATS: NATO ASO series - Hotel Flagman, Sozopol, Bulgaria
Duration: 12 Sep 201920 Sep 2019
http://nato-asi-2019.alfasmart.eu/#home

Publication series

NameNATO Science for Peace and Security Series - B: Physics and Biophysics
PublisherSpringer

Conference

ConferenceNANOSCIENCE AND NANOTECHNOLOGY IN SECURITY AND PROTECTION AGAINST CBRN THREATS
Country/TerritoryBulgaria
CitySozopol
Period12/09/1920/09/19
Internet address

Keywords

  • CBRN threats
  • CVD diamond

Fingerprint

Dive into the research topics of 'CVD Diamond and Nanodiamond: Versatile Materials for Countering a Wide Range of CBRN Threats'. Together they form a unique fingerprint.

Cite this