Determination of the self-compensation ratio of carbon in AlGaN for HEMTs

Ben Rackauskas*, Michael J. Uren, Steve Stoffels, Ming Zhao, Stefaan Decoutere, Martin Kuball

*Corresponding author for this work

Research output: Contribution to journalArticle (Academic Journal)peer-review

22 Citations (Scopus)
281 Downloads (Pure)

Abstract

Epitaxial AlGaN/GaN/AlGaN-on-Si high-electron mobility structures with and without carbon doping have been studied. By considering the donor density required to suppress a 2D hole gas in the undoped structure, we demonstrate that the $2 \times 10^{19}$ cm-3 substitutional carbon incorporated during metal-organic chemical vapor deposition must be a source of donors as well as acceptors, with a donor to acceptor ratio of at least 0.4. This compensation ratio was determined based on the comparison of substrate bias experiments with TCAD simulations. This value, which was previously unknown, is a key parameter in GaN power switching high- electron- mobility transistors, since it determines the resistivity of the layer used to suppress leakage and increase breakdown voltage.

Original languageEnglish
Pages (from-to)1838-1842
Number of pages5
JournalIEEE Transactions on Electron Devices
Volume65
Issue number5
Early online date27 Mar 2018
DOIs
Publication statusPublished - 1 May 2018

Structured keywords

  • CDTR

Keywords

  • 2D hole gas (2DHG)
  • AlGaN
  • Carbon
  • Compensation
  • GaN
  • Self-compensation

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