Abstract
Polycrystalline diamond films have been grown by hot filament (HF) chemical vapor deposition on WC-Co bar substrates using different CH4/H-2 source gas mixing ratios and two different total gas pressures. Each substrate was mounted so as to span a range of HF-substrate separations, d(f), (and thus substrate temperatures) and therefore samples a spread of incident gas phase chemistry and compositions. Spatially resolved scanning electron microscopy and Raman analysis of the deposited material provides a detailed picture of the evolution of film morphology, growth rate, sp(3)/sp(2) content and stress with df in each deposited sample, and of how these properties vary with process conditions. The experimental study is complemented by two-dimensional model calculations of the HF-activated gas phase chemistry and composition, which succeeds in reproducing the measured growth rates well. (C) 2011 Elsevier B.V. All rights reserved.
| Original language | English |
|---|---|
| Pages (from-to) | 641-650 |
| Number of pages | 10 |
| Journal | Diamond and Related Materials |
| Volume | 20 |
| Issue number | 5-6 |
| DOIs | |
| Publication status | Published - 2011 |
Fingerprint
Dive into the research topics of 'Diamond growth on WC-Co substrates by hot filament chemical vapor deposition: Effect of filament-substrate separation'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver