Abstract
We report bulk-quality n-type SrTiO3 (n-SrTiO3) thin films fabricated by pulsed laser deposition, with electron mobility as high as 6600 cm(2) V-1 s(-1) at 2 K and carrier density as low as 2.0x10(18) cm(-3) (similar to 0.02 at. %), far exceeding previous pulsed laser deposition films. This result stems from precise strontium and oxygen vacancy defect chemistry management, providing a general approach for defect control in complex oxide heteroepitaxy. (C) 2010 American Institute of Physics. [doi:10.1063/1.3457994]
Original language | English |
---|---|
Article number | 012107 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 97 |
Issue number | 1 |
DOIs | |
Publication status | Published - 5 Jul 2010 |
Keywords
- carrier density
- electron mobility
- pulsed laser deposition
- semiconductor epitaxial layers
- semiconductor growth
- strontium compounds
- vacancies (crystal)
- STRONTIUM-TITANATE
- SINGLE-CRYSTALS
- DIFFUSION
- SURFACE
- GROWTH
- INTERFACE
- INSULATOR
- OXIDES