TY - JOUR
T1 - Enhanced photoluminescence of rare-earth doped films prepared by off-axis pulsed laser deposition
AU - Serna, R.
AU - Nuñez-Sanchez, S.
AU - Xu, Fei
AU - Afonso, C. N.
PY - 2011/4/1
Y1 - 2011/4/1
N2 - Alternate pulsed laser deposition from the host (Al2O 3) and dopant (Er, Yb) targets has been used to prepare artificially nanostructured films in which the rare earth ion-ion separation is controlled in the nanometer scale in order to control energy transfer between ions. One series of films was prepared in the standard on-axis configuration, i.e. a static substrate being centred with respect to the plasma expansion axis. A second series of films was prepared by rotating the substrate with respect to a shifted axis parallel to the plasma expansion one (off-axis configuration). The latter configuration leads to films with enhanced thickness and Er related photoluminescence intensity uniformity. More interestingly, the Er related photoluminescence lifetime in as-grown films increases up to 2.5 ms, which is much higher than the maximum value of 1 ms obtained for the on-axis configuration films. This enhancement is discussed in terms of a decrease of defect density when using the off-axis configuration.
AB - Alternate pulsed laser deposition from the host (Al2O 3) and dopant (Er, Yb) targets has been used to prepare artificially nanostructured films in which the rare earth ion-ion separation is controlled in the nanometer scale in order to control energy transfer between ions. One series of films was prepared in the standard on-axis configuration, i.e. a static substrate being centred with respect to the plasma expansion axis. A second series of films was prepared by rotating the substrate with respect to a shifted axis parallel to the plasma expansion one (off-axis configuration). The latter configuration leads to films with enhanced thickness and Er related photoluminescence intensity uniformity. More interestingly, the Er related photoluminescence lifetime in as-grown films increases up to 2.5 ms, which is much higher than the maximum value of 1 ms obtained for the on-axis configuration films. This enhancement is discussed in terms of a decrease of defect density when using the off-axis configuration.
KW - Amorphous aluminum oxide (AlO)
KW - Erbium (Er)
KW - Photoluminescence
KW - Pulsed laser deposition (PLD)
KW - Rare-earth
KW - Thin film
KW - Ytterbium (Yb)
UR - http://www.scopus.com/inward/record.url?scp=79952310720&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2010.11.148
DO - 10.1016/j.apsusc.2010.11.148
M3 - Article (Academic Journal)
AN - SCOPUS:79952310720
SN - 0169-4332
VL - 257
SP - 5204
EP - 5207
JO - Applied Surface Science
JF - Applied Surface Science
IS - 12
ER -