Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma

Z Ren, PJ Heard, JM Marshall, PA Thomas, S Yu

Research output: Contribution to journal › Article (Academic Journal) › peer-review

67 Citations (Scopus)

Translated title of the contribution	Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma
Original language	English
Pages (from-to)	1 - 8
Number of pages	8
Journal	Journal of Applied Physics
Volume	103 (034109)
DOIs	https://doi.org/10.1063/1.2838180
Publication status	Published - Feb 2008

Access to Document

@article{27ed95ef5d5d4314a9df6a96d0a527dc,

title = "Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma",

author = "Z Ren and PJ Heard and JM Marshall and PA Thomas and S Yu",

year = "2008",

month = feb,

doi = "10.1063/1.2838180",

language = "English",

volume = "103 (034109)",

pages = "1 -- 8",

journal = "Journal of Applied Physics",

issn = "1089-7550",

publisher = "American Institute of Physics (AIP)",

}

TY - JOUR

T1 - Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma

AU - Ren, Z

AU - Heard, PJ

AU - Marshall, JM

AU - Thomas, PA

AU - Yu, S

PY - 2008/2

Y1 - 2008/2

U2 - 10.1063/1.2838180

DO - 10.1063/1.2838180

M3 - Article (Academic Journal)

SN - 1089-7550

VL - 103 (034109)

SP - 1

EP - 8

JO - Journal of Applied Physics

JF - Journal of Applied Physics

ER -