Etching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma

Z Ren, PJ Heard, JM Marshall, PA Thomas, S Yu

Research output: Contribution to journalArticle (Academic Journal)peer-review

54 Citations (Scopus)
Translated title of the contributionEtching characteristics of LiNbO3 in reactive ion etching and inductively coupled plasma
Original languageEnglish
Pages (from-to)1 - 8
Number of pages8
JournalJournal of Applied Physics
Volume103 (034109)
DOIs
Publication statusPublished - Feb 2008

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