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Evidence of relationship between strain and In-incorporation: Growth of N-polar In-rich InAlN buffer layer by OMCVD
Prerna Chauhan, S Hasenöhrl , E Dobročka, M P Chauvat, A Minj, Filip Gucmann, Ľ Vančo, J Kováč, Jr., S Kret, P Ruterana, Martin Kuball, P Šiffalovič, J Kuzmík
Research output: Contribution to journal › Article (Academic Journal) › peer-review