Fabrication of photonic crystal structures by focused ion beam etching

M Hill; MJ Cryan; N Lim; R Varrazza; P Heard; S Yu; JM Rorison

doi:10.1109/ICTON.2004.1361987

Fabrication of photonic crystal structures by focused ion beam etching

M Hill
, MJ Cryan
, N Lim
, R Varrazza
, P Heard
, S Yu
, JM Rorison

Communication Systems and Networks

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

1 Citation (Scopus)

420 Downloads (Pure)

Abstract

Two methods for Focused Ion Beam (FIB) etching of photonic crystal are presented. The first is a FIB-alone approach which is a very rapid, maskless process. This method has the disadvantage that it produces poor sidewall verticality, which leads to high losses in slab waveguide based systems. A second approach uses FIB to etch a metal mask layer, this is followed by reactive ion etching (RIE) of a SiO2 layer and a final inductively coupled plasma (ICP) etch of the InP layer. Results show much improved sidewall verticality.

Translated title of the contribution	Fabrication of photonic crystal structures by focused ion beam etching
Original language	English
Title of host publication	6th International Conference on Transparent Optical Networks (ICTON 2004), Wroclaw, Poland
Publisher	Institute of Electrical and Electronics Engineers (IEEE)
Pages	135 - 138
Number of pages	9
Volume	2
ISBN (Print)	0780383435
DOIs	https://doi.org/10.1109/ICTON.2004.1361987
Publication status	Published - Jul 2004
Event	6th International Conference on Transparent Optical Networks - Wroclaw, Poland Duration: 4 Jul 2004 → 8 Jul 2004

Conference

Conference	6th International Conference on Transparent Optical Networks
Country/Territory	Poland
City	Wroclaw
Period	4/07/04 → 8/07/04

Bibliographical note

Rose publication type: Conference contribution

Terms of use: Copyright © 2004 IEEE. Reprinted from 6th International Conference on Transparent Optical Networks, 2004.

This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of the University of Bristol's products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to [email protected].

By choosing to view this document, you agree to all provisions of the copyright laws protecting it.

Research Groups and Themes

Photonics and Quantum

Keywords

Focused Ion Beam (FIB) etching

Access to Document

10.1109/ICTON.2004.1361987

Hill IEEE ICTON 2004Accepted author manuscript, 288 KB

http://hdl.handle.net/1983/1290

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Cite this

Hill, M., Cryan, MJ., Lim, N., Varrazza, R., Heard, P., Yu, S., & Rorison, JM. (2004). Fabrication of photonic crystal structures by focused ion beam etching. In 6th International Conference on Transparent Optical Networks (ICTON 2004), Wroclaw, Poland (Vol. 2, pp. 135 - 138). Institute of Electrical and Electronics Engineers (IEEE). https://doi.org/10.1109/ICTON.2004.1361987

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abstract = "Two methods for Focused Ion Beam (FIB) etching of photonic crystal are presented. The first is a FIB-alone approach which is a very rapid, maskless process. This method has the disadvantage that it produces poor sidewall verticality, which leads to high losses in slab waveguide based systems. A second approach uses FIB to etch a metal mask layer, this is followed by reactive ion etching (RIE) of a SiO2 layer and a final inductively coupled plasma (ICP) etch of the InP layer. Results show much improved sidewall verticality.",

keywords = "Focused Ion Beam (FIB) etching",

author = "M Hill and MJ Cryan and N Lim and R Varrazza and P Heard and S Yu and JM Rorison",

note = "Rose publication type: Conference contribution Terms of use: Copyright {\textcopyright} 2004 IEEE. Reprinted from 6th International Conference on Transparent Optical Networks, 2004. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of the University of Bristol's products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to [email protected]. By choosing to view this document, you agree to all provisions of the copyright laws protecting it. ; 6th International Conference on Transparent Optical Networks ; Conference date: 04-07-2004 Through 08-07-2004",

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Hill, M, Cryan, MJ, Lim, N, Varrazza, R, Heard, P, Yu, S & Rorison, JM 2004, Fabrication of photonic crystal structures by focused ion beam etching. in 6th International Conference on Transparent Optical Networks (ICTON 2004), Wroclaw, Poland. vol. 2, Institute of Electrical and Electronics Engineers (IEEE), pp. 135 - 138, 6th International Conference on Transparent Optical Networks, Wroclaw, Poland, 4/07/04. https://doi.org/10.1109/ICTON.2004.1361987

Fabrication of photonic crystal structures by focused ion beam etching. / Hill, M; Cryan, MJ; Lim, N et al.
6th International Conference on Transparent Optical Networks (ICTON 2004), Wroclaw, Poland. Vol. 2 Institute of Electrical and Electronics Engineers (IEEE), 2004. p. 135 - 138.

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

TY - GEN

T1 - Fabrication of photonic crystal structures by focused ion beam etching

AU - Hill, M

AU - Cryan, MJ

AU - Lim, N

AU - Varrazza, R

AU - Heard, P

AU - Yu, S

AU - Rorison, JM

N1 - Rose publication type: Conference contribution Terms of use: Copyright © 2004 IEEE. Reprinted from 6th International Conference on Transparent Optical Networks, 2004. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of the University of Bristol's products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to [email protected]. By choosing to view this document, you agree to all provisions of the copyright laws protecting it.

PY - 2004/7

Y1 - 2004/7

N2 - Two methods for Focused Ion Beam (FIB) etching of photonic crystal are presented. The first is a FIB-alone approach which is a very rapid, maskless process. This method has the disadvantage that it produces poor sidewall verticality, which leads to high losses in slab waveguide based systems. A second approach uses FIB to etch a metal mask layer, this is followed by reactive ion etching (RIE) of a SiO2 layer and a final inductively coupled plasma (ICP) etch of the InP layer. Results show much improved sidewall verticality.

AB - Two methods for Focused Ion Beam (FIB) etching of photonic crystal are presented. The first is a FIB-alone approach which is a very rapid, maskless process. This method has the disadvantage that it produces poor sidewall verticality, which leads to high losses in slab waveguide based systems. A second approach uses FIB to etch a metal mask layer, this is followed by reactive ion etching (RIE) of a SiO2 layer and a final inductively coupled plasma (ICP) etch of the InP layer. Results show much improved sidewall verticality.

KW - Focused Ion Beam (FIB) etching

U2 - 10.1109/ICTON.2004.1361987

DO - 10.1109/ICTON.2004.1361987

M3 - Conference Contribution (Conference Proceeding)

SN - 0780383435

VL - 2

SP - 135

EP - 138

BT - 6th International Conference on Transparent Optical Networks (ICTON 2004), Wroclaw, Poland

PB - Institute of Electrical and Electronics Engineers (IEEE)

T2 - 6th International Conference on Transparent Optical Networks

Y2 - 4 July 2004 through 8 July 2004

ER -

Fabrication of photonic crystal structures by focused ion beam etching

Abstract

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Bibliographical note

Research Groups and Themes

Keywords

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