Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

Matteo Cherchi, Sami Ylinen, Mikko Harjanne, Markku Kapulainen, Tapani Vehmas, Timo Aalto, George T. Kanellos, Dimitris Fitsios, Nikos Pleros

Research output: Chapter in Book/Report/Conference proceedingConference Contribution (Conference Proceeding)

5 Citations (Scopus)

Abstract

We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 Îm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

Original languageEnglish
Title of host publicationSilicon Photonics IX
PublisherSociety of Photo-Optical Instrumentation Engineers (SPIE)
Volume8990
ISBN (Print)9780819499035
DOIs
Publication statusPublished - 1 Jan 2014
EventSilicon Photonics IX - San Francisco, CA, United States
Duration: 3 Feb 20145 Feb 2014

Conference

ConferenceSilicon Photonics IX
CountryUnited States
CitySan Francisco, CA
Period3/02/145/02/14

Keywords

  • Cascaded interlevers
  • High density integration
  • Integrated silicon photonics
  • MMI couplers
  • MZI filters
  • Optical RAM cells
  • Waveguide bends

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