Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

Matteo Cherchi; Sami Ylinen; Mikko Harjanne; Markku Kapulainen; Tapani Vehmas; Timo Aalto; George T. Kanellos; Dimitris Fitsios; Nikos Pleros

doi:10.1117/12.2039954

Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

Matteo Cherchi, Sami Ylinen, Mikko Harjanne, Markku Kapulainen, Tapani Vehmas, Timo Aalto, George T. Kanellos, Dimitris Fitsios, Nikos Pleros

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

6 Citations (Scopus)

Abstract

We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 Îm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

Original language	English
Title of host publication	Silicon Photonics IX
Publisher	Society of Photo-Optical Instrumentation Engineers (SPIE)
Volume	8990
ISBN (Print)	9780819499035
DOIs	https://doi.org/10.1117/12.2039954
Publication status	Published - 1 Jan 2014
Event	Silicon Photonics IX - San Francisco, CA, United States Duration: 3 Feb 2014 → 5 Feb 2014

Conference

Conference	Silicon Photonics IX
Country/Territory	United States
City	San Francisco, CA
Period	3/02/14 → 5/02/14

Keywords

Cascaded interlevers
High density integration
Integrated silicon photonics
MMI couplers
MZI filters
Optical RAM cells
Waveguide bends

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@inproceedings{e6b3ead71d3442bb987f62486cd357f3,

title = "Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform",

abstract = "We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 {\^I}m thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.",

keywords = "Cascaded interlevers, High density integration, Integrated silicon photonics, MMI couplers, MZI filters, Optical RAM cells, Waveguide bends",

author = "Matteo Cherchi and Sami Ylinen and Mikko Harjanne and Markku Kapulainen and Tapani Vehmas and Timo Aalto and Kanellos, {George T.} and Dimitris Fitsios and Nikos Pleros",

year = "2014",

month = jan,

day = "1",

doi = "10.1117/12.2039954",

language = "English",

isbn = "9780819499035",

volume = "8990",

booktitle = "Silicon Photonics IX",

publisher = "Society of Photo-Optical Instrumentation Engineers (SPIE)",

address = "United States",

note = "Silicon Photonics IX ; Conference date: 03-02-2014 Through 05-02-2014",

}

Cherchi, M, Ylinen, S, Harjanne, M, Kapulainen, M, Vehmas, T, Aalto, T, Kanellos, GT, Fitsios, D & Pleros, N 2014, Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform. in Silicon Photonics IX. vol. 8990, 89900F, Society of Photo-Optical Instrumentation Engineers (SPIE), Silicon Photonics IX, San Francisco, CA, United States, 3/02/14. https://doi.org/10.1117/12.2039954

TY - GEN

T1 - Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

AU - Cherchi, Matteo

AU - Ylinen, Sami

AU - Harjanne, Mikko

AU - Kapulainen, Markku

AU - Vehmas, Tapani

AU - Aalto, Timo

AU - Kanellos, George T.

AU - Fitsios, Dimitris

AU - Pleros, Nikos

PY - 2014/1/1

Y1 - 2014/1/1

N2 - We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 Îm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

AB - We present the first characterization results of some cascaded interleavers that we have recently fabricated on 4 Îm thick Silicon on Insulator (SOI) wafers. The filters are based on strip waveguides, micron-scale bends and compact MMIs, all components with low loss and high tolerance to fabrication errors, due to the high mode confinement in the silicon region. A thorough comparison of the found results with the theoretical model will be presented, taking into account fabrication limitations. The fabricated filters will be used in the optical RAM circuits of the RAMPLAS project funded by the European Commission.

KW - Cascaded interlevers

KW - High density integration

KW - Integrated silicon photonics

KW - MMI couplers

KW - MZI filters

KW - Optical RAM cells

KW - Waveguide bends

UR - http://www.scopus.com/inward/record.url?scp=84901814586&partnerID=8YFLogxK

U2 - 10.1117/12.2039954

DO - 10.1117/12.2039954

M3 - Conference Contribution (Conference Proceeding)

AN - SCOPUS:84901814586

SN - 9780819499035

VL - 8990

BT - Silicon Photonics IX

PB - Society of Photo-Optical Instrumentation Engineers (SPIE)

T2 - Silicon Photonics IX

Y2 - 3 February 2014 through 5 February 2014

ER -

Fabrication-tolerant optical filters for dense integration on a micron-scale SOI platform

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