We report on the finite element analysis of stress distribution at the coalescence boundary in epitaxial lateral overgrown (ELO) GaN related to voids. Different void geometries were considered in our model to investigate the influence of their size/shape on the stress distribution. Large compressive stress is localized in the vicinity of the voids, also an increased tensile stress is present at the corners of the SiN mask. Confocal micro-Raman mapping experiments confirm the presence of increased stress at the coalescence boundary of ELO GaN.
|Translated title of the contribution||Finite element analysis of epitaxial lateral overgroan GaN: Voids at the coalescence boundary|
|Pages (from-to)||4127 - 4129|
|Number of pages||3|
|Journal||Applied Physics Letters|
|Publication status||Published - Dec 2001|
Bibliographical notePublisher: American Institute of Physics
Benyoucef, M., Kuball, MHH., Hill, GFJ., Wisnom, MR., Beaumont, B., & Gibart, P. (2001). Finite element analysis of epitaxial lateral overgroan GaN: Voids at the coalescence boundary. Applied Physics Letters, 79(25), 4127 - 4129. https://doi.org/10.1063/1.1426276