Focused ion beam etching for the fabrication of micropillar microcavities made of III-V semiconductor materials

Y-LD Ho, R Gibson, C Hu, MJ Cryan, JG Rarity, PJ Heard, JA Timpson, AM Fox, MS Skolnick, M Hopkinson, A Tahraoui

Research output: Contribution to journalArticle (Academic Journal)peer-review

11 Citations (Scopus)
Translated title of the contributionFocused ion beam etching for the fabrication of micropillar microcavities made of III-V semiconductor materials
Original languageEnglish
Pages (from-to)1197 - 1202
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume25(4)
DOIs
Publication statusPublished - Jun 2007

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