Focused ion beam fabrication and properties of nanoscale Josephson junctions for sensors and other applications

MG Blamire*, C Bell, G Burnell, DJ Kang, A Ruotolo, G Testa, Chris Bell

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference Contribution (Conference Proceeding)

1 Citation (Scopus)

Abstract

The methods of superconducting device fabrication by lithography and multilevel processing usually require a number of processing steps with lithographic resolution and alignment adequate for the scale of the device be fabricated. As an alternative, the focused ion beam (FIB) microscope is increasingly being used directly to fabricate devices. A major advantage of using a FIB compared to other lithography methods is its flexibility and high resolution. It allows in-situ, milling (similar to 5 nm at a beam current of 1 pA) to a variety of depths, and imaging (2 nm) of the sample. In this paper we describe our development of junction fabrication techniques using the FIB and their application in creating a range of potential sensor devices and quantum electronics applications. (c) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Original languageEnglish
Title of host publicationPhysica Status Solidi C - Conferences and Critical Reviews, Vol 2, No 5
EditorsM Stutzmann
Place of PublicationWEINHEIM
PublisherWiley-VCH Verlag
Pages1455-1462
Number of pages8
ISBN (Print)*************
DOIs
Publication statusPublished - 2005
EventNATO Advanced Research Workshop on Advanced Materials for Radiation Detectors and Sensors/Symposium on Superconductors held at the 2004 E-MRS Fall Meeting - Warsaw, Poland
Duration: 6 Sep 200410 Sep 2004

Publication series

NamePHYSICA STATUS SOLIDI C-CURRENT TOPICS IN SOLID STATE PHYSICS
PublisherWILEY-V C H VERLAG GMBH
Volume2
ISSN (Print)1610-1634

Conference

ConferenceNATO Advanced Research Workshop on Advanced Materials for Radiation Detectors and Sensors/Symposium on Superconductors held at the 2004 E-MRS Fall Meeting
Country/TerritoryPoland
Period6/09/0410/09/04

Keywords

  • QUANTUM INTERFERENCE DEVICE
  • ASYMMETRY MODULATED SQUIDS
  • NORMAL METAL BILAYERS
  • VOLTAGE STANDARDS
  • REALIZATION
  • TECHNOLOGY
  • STATES

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