Focused ion beam fabrication of two dimensional photonic crystals in silicon-on-insulator

SK Balasubramanian, PJ Heard, MJ Cryan

Research output: Contribution to journalArticle (Academic Journal)peer-review

14 Citations (Scopus)

Abstract

This article presents results for the optical characterization of two-dimensional photonic crystals (PhCs) in silicon-on-insulator fabricated using focused ion beam (FIB) etching. A detailed description of fabrication techniques is given and the use of gas assisted etching for large area etches is outlined. The optical characterization shows PhC band edges at the expected wavelengths but with reduced depth. Three dimensional finite difference time domain modeling is used to investigate this discrepancy and this suggests that reduced sidewall verticality is not critical in this strong vertical guiding regime. Other possible explanations for reduced band edge depth are discussed including gallium implantation and FIB induced optical damage.
Translated title of the contributionFocused ion beam fabrication of two dimensional photonic crystals in silicon-on-insulator
Original languageEnglish
Pages (from-to)2533 - 2537
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume24 (6)
DOIs
Publication statusPublished - Nov 2006

Bibliographical note

Publisher: American Vacuum Society

Fingerprint Dive into the research topics of 'Focused ion beam fabrication of two dimensional photonic crystals in silicon-on-insulator'. Together they form a unique fingerprint.

Cite this