Focused ion beam (FIB) etching for the fabrication of micro-pillar microcavities made of III-V semiconductor materials

Y-LD Ho, R Gibson, C Hu, MJ Cryan, JG Rarity, PJ Heard, JA Timpson, AM Fox, MS Skolnick, M Hopkinson, A Tahraoui

Research output: Chapter in Book/Report/Conference proceedingConference Contribution (Conference Proceeding)

Original languageEnglish
Title of host publicationNanoFIB, Manchester, UK
Publication statusPublished - 2007

Bibliographical note

Conference Organiser: Royal Microscopical Society

Cite this

Ho, Y-LD., Gibson, R., Hu, C., Cryan, MJ., Rarity, JG., Heard, PJ., Timpson, JA., Fox, AM., Skolnick, MS., Hopkinson, M., & Tahraoui, A. (2007). Focused ion beam (FIB) etching for the fabrication of micro-pillar microcavities made of III-V semiconductor materials. In NanoFIB, Manchester, UK