Focused ion beam (FIB) etching for the fabrication of micro-pillar microcavities made of III-V semiconductor materials

Y-LD Ho, R Gibson, C Hu, MJ Cryan, JG Rarity, PJ Heard, JA Timpson, AM Fox, MS Skolnick, M Hopkinson, A Tahraoui

Research output: Chapter in Book/Report/Conference proceedingConference Contribution (Conference Proceeding)

Translated title of the contributionFocused ion beam (FIB) etching for the fabrication of micro-pillar microcavities made of III-V semiconductor materials
Original languageEnglish
Title of host publicationNanoFIB, Manchester, UK
Publication statusPublished - 2007

Bibliographical note

Conference Organiser: Royal Microscopical Society

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