Growth and characterization of uranium-zirconium alloy thin films for nuclear industry applications

A. M. Adamska*, R. Springell, A D Warren, L. Picco, O. Payton, T. B. Scott

*Corresponding author for this work

Research output: Contribution to journalArticle (Academic Journal)peer-review

5 Citations (Scopus)

Abstract

Polycrystalline and epitaxial U-Zr thin films have been grown on glass and single-crystal sapphire substrates using ultra-high vacuum magnetron sputtering at high temperatures (T = 800 degrees C). Mixed alpha-and gamma-U phases were detected for polycrystalline U-Zr alloy thin films with the prevailing crystal structure controlled by composition. Epitaxial U-Zr thin film samples were determined to form bi-layered structures of single-crystal gamma-U and alpha-U phases or gamma-U, delta UZr2 and alpha-U phases depending on the concentration of the alloying element.

Original languageEnglish
Article number315301
Number of pages10
JournalJournal of Physics D: Applied Physics
Volume47
Issue number31
DOIs
Publication statusPublished - 6 Aug 2014

Keywords

  • U-Zr alloys
  • magnetron sputtering
  • thin films
  • structure
  • XRD
  • EBSD
  • FIB
  • SEM
  • AFM
  • X-RAY
  • ALPHA-URANIUM
  • THERMAL EXPANSION
  • SAPPHIRE
  • NB(110)

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