Graphene-based materials such as graphene oxide (GO) and chemically reduced graphene oxide (rGO) thin films have been fabricated using electrostatic spray deposition (ESD), followed by thermal annealing under Ar/H2 atmosphere. The thickness and surface morphology of thin films of GO and rGO on silicon substrates were controlled by varying deposition time and content of GO/rGO in tetrahydrofuran (THF) solution. Here, we present a comparative analysis between GO and rGO thin films. Water contact angle (WCA) measurements of these thin films were ~88° for the GO films and >127° for the rGO films. We discuss how their hydrophobic behaviour is influenced by removal of oxygen-containing functional groups during the reduction process. Graphical abstract: [Figure not available: see fulltext.]
Bibliographical noteFunding Information:
RZ would like to thank the funding scheme of the Government of Republic of Kazakhstan under the Bolashak programme. OU and OT wish to acknowledge the support from the Ministry of Education and Science of the Republic of Kazakhstan under Grant No. AP08052848 and AP05135057.
© 2021, Indian Academy of Sciences.
Copyright 2021 Elsevier B.V., All rights reserved.
- Carbon materials
- electrostatic spray deposition
- reduced graphene oxide
- thin films