Imaging the Surface of a Polycrystalline Electrodeposited Cu Film in Real Time Using in Situ High-Speed AFM

Aswathi Koorikkat, Oliver Payton, Loren Picco, Walther Schwarzacher*

*Corresponding author for this work

Research output: Contribution to journalArticle (Academic Journal)peer-review

Abstract

We studied the surface evolution of polycrystalline Cu films electrodeposited from an organic additive-free acid sulphate electrolyte on to a gold microelectrode using a high-speed Atomic Force Microscope (HS-AFM) which images an area of 2 2 μm at 2 frames per second and a resolution of 1000 1000 pixels. The ability to acquire data at this rate opens even fast growth processes to in situ investigation. Real-time images from a film deposited at ∼0.5 nm s-1 revealed many interesting phenomena, most significantly highly non-uniform grain growth rates with several examples of grains showing accelerated growth compared to their neighbours. Grain overgrowth was also observed in different regions of the sample. Surface roughness scaling and slope analysis provided evidence for structural coarsening of the film and an increase in the mean slope θ with increasing film thickness t. We show how both grain overgrowth and an increase in θ can contribute to the coarsening of the surface structure as deposition proceeds.

Original languageEnglish
Article number162510
JournalJournal of the Electrochemical Society
Volume167
Issue number16
DOIs
Publication statusPublished - Dec 2020

Bibliographical note

Publisher Copyright:
© 2020 The Electrochemical Society ("ECS"). Published on behalf of ECS by IOP Publishing Limited.

Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.

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