Investigation of an optically induced superstrate plasma for tuning microstrip antennas

Chris Gamlath, Michael Collett, Alexander Pang, David Benton, Martin Cryan*

*Corresponding author for this work

Research output: Contribution to journalArticle (Academic Journal)peer-review

2 Citations (Scopus)
245 Downloads (Pure)


Optically induced electron–hole plasmas in silicon are used to perform radiation pattern tuning. The antenna is a slot loaded microstrip patch and the effect of illumination is shown to produce beam switching in the radiation patterns of certain modes while other modes are left unaffected. The structure is specifically designed to make the best use of currently available miniature laser sources to form a compact tunable package. Modelled and measured results for tuning of the radiation patterns and frequency response are presented. The effect of the losses incurred by the plasma along with the losses in the optically transparent ground plane are quantified in both simulation and measurement. This forms the basis for designing other types of optically tunable miniature antennas based on the structure presented.
Original languageEnglish
Pages (from-to)230-236
Number of pages7
JournalIET Optoelectronics
Issue number6
Early online date28 Sep 2017
Publication statusPublished - 1 Dec 2017


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