| Translated title of the contribution | Ion energy and angular distributions at the anode of RF etch reactors |
|---|---|
| Original language | English |
| Pages (from-to) | 257 - 264 |
| Number of pages | 7 |
| Journal | Journal of Physics Condensed Matter |
| Volume | 3 |
| Publication status | Published - 1991 |
Bibliographical note
Other: # Pages S257-S264Research Groups and Themes
- Physical & Theoretical
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