Translated title of the contribution | Ion energy distributions and sidewall profiles in reactive ion etching |
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Original language | English |
Title of host publication | Plasma processing of materials |
Editors | JJ Pouch, SA Alterovitz |
Publisher | Trans Tech Publications Inc |
Pages | 121 - 132 |
Number of pages | 11 |
ISBN (Print) | 08784670X |
Publication status | Published - 1993 |
Ion energy distributions and sidewall profiles in reactive ion etching
PW May, D Field, DF Klemperer, YP Song
Research output: Chapter in Book/Report/Conference proceeding › Chapter in a book