Ion energy distributions and sidewall profiles in reactive ion etching

PW May, D Field, DF Klemperer, YP Song

Research output: Chapter in Book/Report/Conference proceedingChapter in a book

Translated title of the contributionIon energy distributions and sidewall profiles in reactive ion etching
Original languageEnglish
Title of host publicationPlasma processing of materials
EditorsJJ Pouch, SA Alterovitz
PublisherTrans Tech Publications Inc
Pages121 - 132
Number of pages11
ISBN (Print)08784670X
Publication statusPublished - 1993

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