Ion energy distributions and sidewall profiles in reactive ion etching

PW May, D Field, DF Klemperer, YP Song

Research output: Chapter in Book/Report/Conference proceeding › Chapter in a book

Translated title of the contribution	Ion energy distributions and sidewall profiles in reactive ion etching
Original language	English
Title of host publication	Plasma processing of materials
Editors	JJ Pouch, SA Alterovitz
Publisher	Trans Tech Publications Inc
Pages	121 - 132
Number of pages	11
ISBN (Print)	08784670X
Publication status	Published - 1993

Research Groups and Themes

@inbook{5ca791ee2db14456bbeaa9d084a640e7,

title = "Ion energy distributions and sidewall profiles in reactive ion etching",

author = "PW May and D Field and DF Klemperer and YP Song",

year = "1993",

language = "English",

isbn = "08784670X",

pages = "121 -- 132",

editor = "JJ Pouch and SA Alterovitz",

booktitle = "Plasma processing of materials",

publisher = "Trans Tech Publications Inc",

address = "Switzerland",

}