Ion energy distributions at the anode of a reactive ion etcher

AC Dickenson, D Field, DF Klemperer, PW May, PC Johnson, RA Pitts

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

Translated title of the contribution	Ion energy distributions at the anode of a reactive ion etcher
Original language	English
Title of host publication	Unknown
Volume	730
Publication status	Published - 1993

Conference Proceedings/Title of Journal: 3rd Int Symp on Proc. Physics and Modeling in Semicond. Technol

Handle.net

@inproceedings{889ae1ca4f3346d68df32abf7176204e,

title = "Ion energy distributions at the anode of a reactive ion etcher",

author = "AC Dickenson and D Field and DF Klemperer and PW May and PC Johnson and RA Pitts",

note = "Conference Proceedings/Title of Journal: 3rd Int Symp on Proc. Physics and Modeling in Semicond. Technol",

year = "1993",

language = "English",

isbn = "156670602",

volume = "730",

booktitle = "Unknown",

}

TY - GEN

T1 - Ion energy distributions at the anode of a reactive ion etcher

AU - Dickenson, AC

AU - Field, D

AU - Klemperer, DF

AU - May, PW

AU - Johnson, PC

AU - Pitts, RA

N1 - Conference Proceedings/Title of Journal: 3rd Int Symp on Proc. Physics and Modeling in Semicond. Technol

PY - 1993

Y1 - 1993

M3 - Conference Contribution (Conference Proceeding)

SN - 156670602

VL - 730

BT - Unknown

ER -