Micromachining and focused ion beam etching of Si for accelerometers

DF Moore, SC Burgess, H-S Chiang, H Klaubert, N Shibaike, T Kiriyama

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

13 Citations (Scopus)

Translated title of the contribution	Micromachining and focused ion beam etching of Si for accelerometers
Original language	English
Title of host publication	SPIE's Symposium on Micromachining, Texas, USA
Pages	253 - 258
Volume	2639
Publication status	Published - Oct 1995

Conference Organiser: SPIE

Handle.net

@inproceedings{cf00d01f848247f6903b55095f7ee94c,

title = "Micromachining and focused ion beam etching of Si for accelerometers",

author = "DF Moore and SC Burgess and H-S Chiang and H Klaubert and N Shibaike and T Kiriyama",

note = "Conference Organiser: SPIE",

year = "1995",

month = oct,

language = "English",

volume = "2639",

pages = "253 -- 258",

booktitle = "SPIE's Symposium on Micromachining, Texas, USA",

}

TY - GEN

T1 - Micromachining and focused ion beam etching of Si for accelerometers

AU - Moore, DF

AU - Burgess, SC

AU - Chiang, H-S

AU - Klaubert, H

AU - Shibaike, N

AU - Kiriyama, T

N1 - Conference Organiser: SPIE

PY - 1995/10

Y1 - 1995/10

M3 - Conference Contribution (Conference Proceeding)

VL - 2639

SP - 253

EP - 258

BT - SPIE's Symposium on Micromachining, Texas, USA

ER -