| Translated title of the contribution | Modelling of the gas-phase chemistry in C-H-O gas mixtures for diamond chemical vapour deposition |
|---|---|
| Original language | English |
| Pages (from-to) | 5219 - 5223 |
| Journal | Journal of Applied Physics |
| Volume | 89 |
| Publication status | Published - 2001 |
Research Groups and Themes
- Physical & Theoretical