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Modifying the Morphology of Silicon Surfaces by Laser Induced Liquid Assisted Colloidal Lithography

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Modifying the Morphology of Silicon Surfaces by Laser Induced Liquid Assisted Colloidal Lithography. / Ulmeanu, Magdalena; Harniman, Robert L; Petkov, P.; Ashfold, Michael N R .

In: Materials, Vol. 10, No. 11, 1306, 11.2017.

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Ulmeanu, Magdalena ; Harniman, Robert L ; Petkov, P. ; Ashfold, Michael N R . / Modifying the Morphology of Silicon Surfaces by Laser Induced Liquid Assisted Colloidal Lithography. In: Materials. 2017 ; Vol. 10, No. 11.

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@article{6d19b95e0db74db4a83b4e465b4dfd26,
title = "Modifying the Morphology of Silicon Surfaces by Laser Induced Liquid Assisted Colloidal Lithography",
abstract = "Single, or isolated small arrays of, spherical silica colloidal particles (with refractive index ncolloid = 1.47 and radius R = 350 nm or 1.5 μm) were placed on a silicon substrate and immersed in carbon tetrachloride (nliquid = 1.48) or toluene (nliquid = 1.52). Areas of the sample were then exposed to a single laser pulse (8 ps duration, wavelength λ = 355 nm), and the spatial intensity modulation of the near field in the vicinity of the particles revealed via the resulting patterning of the substrate surface. In this regime, ncolloid < nliquid and the near-field optical intensification is concentrated at and beyond the edge of the particle. Detailed experimental characterization of the irradiated Si surface using atomic force microscopy reveals contrasting topographies. The same optical behavior is observed with both liquids, i.e., the incident laser light diverges on interaction with the colloidal particle, but the resulting interaction with the substrate is liquid dependent. Topographic analysis indicates localized ablation and patterning of the Si substrate when using toluene, whereas the patterning induced under carbon tetrachloride is on a larger scale and extends well below the original substrate surface—hinting at a laser induced photochemical contribution to the surface patterning",
keywords = "colloids, laser processing, patterning, liquid induced photochemistry",
author = "Magdalena Ulmeanu and Harniman, {Robert L} and P. Petkov and Ashfold, {Michael N R}",
year = "2017",
month = "11",
doi = "10.3390/ma10111306",
language = "English",
volume = "10",
journal = "Materials",
issn = "1996-1944",
publisher = "MDPI AG",
number = "11",

}

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TY - JOUR

T1 - Modifying the Morphology of Silicon Surfaces by Laser Induced Liquid Assisted Colloidal Lithography

AU - Ulmeanu, Magdalena

AU - Harniman, Robert L

AU - Petkov, P.

AU - Ashfold, Michael N R

PY - 2017/11

Y1 - 2017/11

N2 - Single, or isolated small arrays of, spherical silica colloidal particles (with refractive index ncolloid = 1.47 and radius R = 350 nm or 1.5 μm) were placed on a silicon substrate and immersed in carbon tetrachloride (nliquid = 1.48) or toluene (nliquid = 1.52). Areas of the sample were then exposed to a single laser pulse (8 ps duration, wavelength λ = 355 nm), and the spatial intensity modulation of the near field in the vicinity of the particles revealed via the resulting patterning of the substrate surface. In this regime, ncolloid < nliquid and the near-field optical intensification is concentrated at and beyond the edge of the particle. Detailed experimental characterization of the irradiated Si surface using atomic force microscopy reveals contrasting topographies. The same optical behavior is observed with both liquids, i.e., the incident laser light diverges on interaction with the colloidal particle, but the resulting interaction with the substrate is liquid dependent. Topographic analysis indicates localized ablation and patterning of the Si substrate when using toluene, whereas the patterning induced under carbon tetrachloride is on a larger scale and extends well below the original substrate surface—hinting at a laser induced photochemical contribution to the surface patterning

AB - Single, or isolated small arrays of, spherical silica colloidal particles (with refractive index ncolloid = 1.47 and radius R = 350 nm or 1.5 μm) were placed on a silicon substrate and immersed in carbon tetrachloride (nliquid = 1.48) or toluene (nliquid = 1.52). Areas of the sample were then exposed to a single laser pulse (8 ps duration, wavelength λ = 355 nm), and the spatial intensity modulation of the near field in the vicinity of the particles revealed via the resulting patterning of the substrate surface. In this regime, ncolloid < nliquid and the near-field optical intensification is concentrated at and beyond the edge of the particle. Detailed experimental characterization of the irradiated Si surface using atomic force microscopy reveals contrasting topographies. The same optical behavior is observed with both liquids, i.e., the incident laser light diverges on interaction with the colloidal particle, but the resulting interaction with the substrate is liquid dependent. Topographic analysis indicates localized ablation and patterning of the Si substrate when using toluene, whereas the patterning induced under carbon tetrachloride is on a larger scale and extends well below the original substrate surface—hinting at a laser induced photochemical contribution to the surface patterning

KW - colloids

KW - laser processing

KW - patterning

KW - liquid induced photochemistry

U2 - 10.3390/ma10111306

DO - 10.3390/ma10111306

M3 - Article

C2 - 29135967

VL - 10

JO - Materials

JF - Materials

SN - 1996-1944

IS - 11

M1 - 1306

ER -