Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas

PW May, DF Klemperer, D Field

Research output: Contribution to journal › Article (Academic Journal) › peer-review

20 Citations (Scopus)

Translated title of the contribution	Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas
Original language	English
Pages (from-to)	1634 - 1643
Number of pages	9
Journal	Journal of Applied Physics
Volume	73
Publication status	Published - 1993

Cite this

@article{b51f89581b0e4224bea233e154843d26,

title = "Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas",

author = "PW May and DF Klemperer and D Field",

year = "1993",

language = "English",

volume = "73",

pages = "1634 -- 1643",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics (AIP)",

}