Translated title of the contribution | Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas |
---|---|
Original language | English |
Pages (from-to) | 1634 - 1643 |
Number of pages | 9 |
Journal | Journal of Applied Physics |
Volume | 73 |
Publication status | Published - 1993 |
Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas
PW May, DF Klemperer, D Field
Research output: Contribution to journal › Article (Academic Journal) › peer-review
20
Citations
(Scopus)