Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas

PW May, DF Klemperer, D Field

Research output: Contribution to journalArticle (Academic Journal)

20 Citations (Scopus)
Original languageEnglish
Pages (from-to)1634 - 1643
Number of pages9
JournalJournal of Applied Physics
Volume73
Publication statusPublished - 1993

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