Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas

PW May, DF Klemperer, D Field

Research output: Contribution to journalArticle (Academic Journal)

20 Citations (Scopus)
Translated title of the contributionMonte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas
Original languageEnglish
Pages (from-to)1634 - 1643
Number of pages9
JournalJournal of Applied Physics
Volume73
Publication statusPublished - 1993

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