Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas

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Translated title of the contribution	Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas
Original language	English
Pages (from-to)	1634 - 1643
Number of pages	9
Journal	Journal of Applied Physics
Volume	73
Publication status	Published - 1993

Research Groups and Themes

@article{b51f89581b0e4224bea233e154843d26,

title = "Monte Carlo simulations of electron distributions in the sheath region in reactive ion etching plasmas",

author = "PW May and DF Klemperer and D Field",

year = "1993",

language = "English",

volume = "73",

pages = "1634 -- 1643",

journal = "Journal of Applied Physics",

issn = "1089-7550",

publisher = "American Institute of Physics (AIP)",

}