Nanofabrication Using Focused Ion and Electron Beams - Principles and Applications: PART II - APPLICATIONS: 18. FIB Etching for Photonic Device Applications

Martin J Cryan; Y D Ho; Pavlo Ivanov; Peter J Heard; Judy M Rorison; John Rarity

Nanofabrication Using Focused Ion and Electron Beams - Principles and Applications: PART II - APPLICATIONS: 18. FIB Etching for Photonic Device Applications

Martin J Cryan, Y D Ho, Pavlo Ivanov, Peter J Heard, Judy M Rorison, John Rarity

Research output: Chapter in Book/Report/Conference proceeding › Chapter in a book

Original language	English
Title of host publication	Oxford University Press (USA)
Editors	Ivo Utke, Stanislav Moshkalev, Phillip E. Russell
Pages	553-583
Number of pages	31
Publication status	Published - Apr 2012

Structured keywords

QETLabs
Photonics and Quantum

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http://www.us.oup.com/us/catalog/general/subject/EngineeringTechnology/EngineeringTechnology/?view=usa&ci=9780199734214#Description

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Cite this

Cryan, M. J., Ho, Y. D., Ivanov, P., Heard, P. J., Rorison, J. M., & Rarity, J. (2012). Nanofabrication Using Focused Ion and Electron Beams - Principles and Applications: PART II - APPLICATIONS: 18. FIB Etching for Photonic Device Applications. In I. Utke, S. Moshkalev, & P. E. Russell (Eds.), Oxford University Press (USA) (pp. 553-583) http://www.us.oup.com/us/catalog/general/subject/EngineeringTechnology/EngineeringTechnology/?view=usa&ci=9780199734214#Description

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title = "Nanofabrication Using Focused Ion and Electron Beams - Principles and Applications: PART II - APPLICATIONS: 18. FIB Etching for Photonic Device Applications",

author = "Cryan, {Martin J} and Ho, {Y D} and Pavlo Ivanov and Heard, {Peter J} and Rorison, {Judy M} and John Rarity",

year = "2012",

month = apr,

language = "English",

pages = "553--583",

editor = "Ivo Utke and Moshkalev, {Stanislav } and Russell, {Phillip E. }",

booktitle = "Oxford University Press (USA)",

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Cryan, MJ , Ho, YD, Ivanov, P, Heard, PJ, Rorison, JM & Rarity, J 2012, Nanofabrication Using Focused Ion and Electron Beams - Principles and Applications: PART II - APPLICATIONS: 18. FIB Etching for Photonic Device Applications. in I Utke, S Moshkalev & PE Russell (eds), Oxford University Press (USA). pp. 553-583. <http://www.us.oup.com/us/catalog/general/subject/EngineeringTechnology/EngineeringTechnology/?view=usa&ci=9780199734214#Description>

Nanofabrication Using Focused Ion and Electron Beams - Principles and Applications: PART II - APPLICATIONS: 18. FIB Etching for Photonic Device Applications. / Cryan, Martin J ; Ho, Y D; Ivanov, Pavlo et al.
Oxford University Press (USA). ed. / Ivo Utke; Stanislav Moshkalev; Phillip E. Russell. 2012. p. 553-583.

Research output: Chapter in Book/Report/Conference proceeding › Chapter in a book

TY - CHAP

T1 - Nanofabrication Using Focused Ion and Electron Beams - Principles and Applications

T2 - PART II - APPLICATIONS: 18. FIB Etching for Photonic Device Applications

AU - Cryan, Martin J

AU - Ho, Y D

AU - Ivanov, Pavlo

AU - Heard, Peter J

AU - Rorison, Judy M

AU - Rarity, John

PY - 2012/4

Y1 - 2012/4

M3 - Chapter in a book

SP - 553

EP - 583

BT - Oxford University Press (USA)

A2 - Utke, Ivo

A2 - Moshkalev, Stanislav

A2 - Russell, Phillip E.

ER -