Nickel thin films grown by pulsed laser deposition: influence of substrate and substrate temperature

M. Nawaz Rizwan; M. A.  Kalyar; Christopher Bell; M. Anwar-Ul-Haq; A. R.  Makhdoom

Nickel thin films grown by pulsed laser deposition: influence of substrate and substrate temperature

M. Nawaz Rizwan^*, M. A. Kalyar, Christopher Bell, M. Anwar-Ul-Haq, A. R. Makhdoom

^*Corresponding author for this work

School of Physics

Research output: Contribution to journal › Article (Academic Journal) › peer-review

34 Downloads (Pure)

Abstract

Nickel thin films were grown on glass and copper substrate in ultrahigh vacuum at energy density 2×1010 watt/cm2 using Nd:YAG laser. XRD analysis showed the amorphous growth of thin film at low substrate temperature (Ts) while higher Ts supported crystalline growth. Magnetic moment, magnetic residual ratio and coercivity of thin films decreased with increase in Ts for both substrates. However, this decrease was sharp for films deposited on glass substrate as compared to that deposited on copper in Ts range 100°C-500°C. Electrical resistivity of thin film grown on glass substrate decreased while Hall carrier mobility increased with increase in Ts.

Original language	English
Pages (from-to)	1141-1151
Number of pages	11
Journal	Digest Journal of nanomaterials and Biostructures
Volume	15
Issue number	4
Publication status	Published - 1 Dec 2020

Keywords

nickel thin films
pulsed laser deposition
vibrating sample magnetometer (VSM)
anisotropic magnetoresistance (AMR)
resistivity and carrier mobility

Access to Document

Full-text PDF (final published version)
This is the final published version of the article (version of record). It first appeared online via Forum of Chalcogeniders at https://chalcogen.ro/1141_RizwanMN.pdf . Please refer to any applicable terms of use of the publisher.
Final published version, 1.27 MBLicence: CC BY

https://chalcogen.ro/1141_RizwanMN.pdf

Handle.net

Persistent link

Cite this

@article{df409222b9464d409058894666485f49,

title = "Nickel thin films grown by pulsed laser deposition: influence of substrate and substrate temperature",

abstract = "Nickel thin films were grown on glass and copper substrate in ultrahigh vacuum at energy density 2×1010 watt/cm2 using Nd:YAG laser. XRD analysis showed the amorphous growth of thin film at low substrate temperature (Ts) while higher Ts supported crystalline growth. Magnetic moment, magnetic residual ratio and coercivity of thin films decreased with increase in Ts for both substrates. However, this decrease was sharp for films deposited on glass substrate as compared to that deposited on copper in Ts range 100°C-500°C. Electrical resistivity of thin film grown on glass substrate decreased while Hall carrier mobility increased with increase in Ts.",

keywords = "nickel thin films, pulsed laser deposition, vibrating sample magnetometer (VSM), anisotropic magnetoresistance (AMR), resistivity and carrier mobility",

author = "Rizwan, {M. Nawaz} and Kalyar, {M. A.} and Christopher Bell and M. Anwar-Ul-Haq and Makhdoom, {A. R.}",

year = "2020",

month = dec,

day = "1",

language = "English",

volume = "15",

pages = "1141--1151",

journal = "Digest Journal of nanomaterials and Biostructures",

issn = "1842-3582",

number = "4",

}

TY - JOUR

T1 - Nickel thin films grown by pulsed laser deposition

T2 - influence of substrate and substrate temperature

AU - Rizwan, M. Nawaz

AU - Kalyar, M. A.

AU - Bell, Christopher

AU - Anwar-Ul-Haq, M.

AU - Makhdoom, A. R.

PY - 2020/12/1

Y1 - 2020/12/1

N2 - Nickel thin films were grown on glass and copper substrate in ultrahigh vacuum at energy density 2×1010 watt/cm2 using Nd:YAG laser. XRD analysis showed the amorphous growth of thin film at low substrate temperature (Ts) while higher Ts supported crystalline growth. Magnetic moment, magnetic residual ratio and coercivity of thin films decreased with increase in Ts for both substrates. However, this decrease was sharp for films deposited on glass substrate as compared to that deposited on copper in Ts range 100°C-500°C. Electrical resistivity of thin film grown on glass substrate decreased while Hall carrier mobility increased with increase in Ts.

AB - Nickel thin films were grown on glass and copper substrate in ultrahigh vacuum at energy density 2×1010 watt/cm2 using Nd:YAG laser. XRD analysis showed the amorphous growth of thin film at low substrate temperature (Ts) while higher Ts supported crystalline growth. Magnetic moment, magnetic residual ratio and coercivity of thin films decreased with increase in Ts for both substrates. However, this decrease was sharp for films deposited on glass substrate as compared to that deposited on copper in Ts range 100°C-500°C. Electrical resistivity of thin film grown on glass substrate decreased while Hall carrier mobility increased with increase in Ts.

KW - nickel thin films

KW - pulsed laser deposition

KW - vibrating sample magnetometer (VSM)

KW - anisotropic magnetoresistance (AMR)

KW - resistivity and carrier mobility

M3 - Article (Academic Journal)

VL - 15

SP - 1141

EP - 1151

JO - Digest Journal of nanomaterials and Biostructures

JF - Digest Journal of nanomaterials and Biostructures

SN - 1842-3582

IS - 4

ER -

Nickel thin films grown by pulsed laser deposition: influence of substrate and substrate temperature

Abstract

Keywords

Access to Document

Handle.net

Fingerprint

Cite this