Optical investigation of micrometer and nanometer-size individual GaN pillars fabricated by reactive ion etching

F Demangeot, J Gleize, J Frandon, MA Renucci, MHH Kuball, D Peyrade, L Manin-Ferlazzo, Y Chen, N Grandjean

Research output: Contribution to journal › Article (Academic Journal) › peer-review

33 Citations (Scopus)

Translated title of the contribution	Optical investigation of micrometer and nanometer-size individual GaN pillars fabricated by reactive ion etching
Original language	English
Pages (from-to)	6520 - 6523
Journal	Journal of Applied Physics
Volume	91
Publication status	Published - 2002

Research Groups and Themes

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title = "Optical investigation of micrometer and nanometer-size individual GaN pillars fabricated by reactive ion etching",

author = "F Demangeot and J Gleize and J Frandon and MA Renucci and MHH Kuball and D Peyrade and L Manin-Ferlazzo and Y Chen and N Grandjean",

year = "2002",

language = "English",

volume = "91",

pages = "6520 -- 6523",

journal = "Journal of Applied Physics",

issn = "1089-7550",

publisher = "American Institute of Physics (AIP)",

}

TY - JOUR

T1 - Optical investigation of micrometer and nanometer-size individual GaN pillars fabricated by reactive ion etching

AU - Demangeot, F

AU - Gleize, J

AU - Frandon, J

AU - Renucci, MA

AU - Kuball, MHH

AU - Peyrade, D

AU - Manin-Ferlazzo, L

AU - Chen, Y

AU - Grandjean, N

PY - 2002

Y1 - 2002

M3 - Article (Academic Journal)

SN - 1089-7550

VL - 91

SP - 6520

EP - 6523

JO - Journal of Applied Physics

JF - Journal of Applied Physics

ER -