Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operation with C/H/Ar gas mixtures

YA Mankelevich, MNR Ashfold, J Ma

Research output: Contribution to journalArticle (Academic Journal)peer-review

81 Citations (Scopus)
Translated title of the contributionPlasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operation with C/H/Ar gas mixtures
Original languageEnglish
Pages (from-to)113304:1 - 113304:11
Number of pages11
JournalJournal of Applied Physics
Volume104
DOIs
Publication statusPublished - Dec 2008

Bibliographical note

Publisher: American Institute of Physics

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