Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operation with C/H/Ar gas mixtures

YA Mankelevich, MNR Ashfold, J Ma

Research output: Contribution to journal › Article (Academic Journal) › peer-review

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Translated title of the contribution	Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operation with C/H/Ar gas mixtures
Original language	English
Pages (from-to)	113304:1 - 113304:11
Number of pages	11
Journal	Journal of Applied Physics
Volume	104
DOIs	https://doi.org/10.1063/1.3035850
Publication status	Published - Dec 2008

Publisher: American Institute of Physics

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title = "Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operation with C/H/Ar gas mixtures",

author = "YA Mankelevich and MNR Ashfold and J Ma",

note = "Publisher: American Institute of Physics",

year = "2008",

month = dec,

doi = "10.1063/1.3035850",

language = "English",

volume = "104",

pages = "113304:1 -- 113304:11",

journal = "Journal of Applied Physics",

issn = "1089-7550",

publisher = "American Institute of Physics (AIP)",

}

TY - JOUR

T1 - Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operation with C/H/Ar gas mixtures

AU - Mankelevich, YA

AU - Ashfold, MNR

AU - Ma, J

N1 - Publisher: American Institute of Physics

PY - 2008/12

Y1 - 2008/12

U2 - 10.1063/1.3035850

DO - 10.1063/1.3035850

M3 - Article (Academic Journal)

SN - 1089-7550

VL - 104

SP - 113304:1 - 113304:11

JO - Journal of Applied Physics

JF - Journal of Applied Physics

ER -