Pushing the boundaries of local oxidation nanolithography: Short timescales and high speeds

JA Vicary, MJ Miles

Research output: Contribution to journalArticle (Academic Journal)peer-review

18 Citations (Scopus)

Abstract

Fabrication of nanometre-scale structures in short timescales and with high throughput has great importance in the future of nanoscale science and technology. We show that the local oxidation of hydrogen-passivated silicon surfaces by intermittent-contact mode atomic force microscopy can be applied on timescales as low as 500 ns to create single oxide nanostructures with dimensions of 0.6 x 15nm(2). Furthermore, we report on preliminary experiments demonstrating that local oxidation can also be achieved with relative tip-sample speeds in excess of 2cms(-1) in order to pattern larger areas. This was realised using a high-speed scan stage based on a quartz crystal resonator operating at 20 kHz.
Translated title of the contributionPushing the boundaries of local oxidation nanolithography: Short timescales and high speeds
Original languageEnglish
Pages (from-to)1120 - 1123
JournalUltramicroscopy
Volume108
DOIs
Publication statusPublished - Oct 2007

Bibliographical note

Publisher: Elsevier

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