Quantitative Analysis of Chloride Ion Influence on the Surface Morphology of Electrodeposited Polycrystalline Nickel Films

Different anions are well-known to influence the microstructure and morphology ofelectrodeposited polycrystalline metal films, and thereby their suitability for specificapplications. However, quantifying their effects on film morphology remains a challenge. Herewe present results for Ni thin films electrodeposited under potentiostatic control from two typesof nickel sulphate bath with or without the presence of 0.2 M chloride ions. Slope and scalinganalysis of AFM data reveal clear differences in the morphologies of films deposited from thetwo baths. X-ray diffraction and electron backscatter diffraction enables correlation of thesedifferences with the film microstructures. Additionally, slope analysis provides insight into theterrace width, a quantity important in understanding the thin film growth process.