RF plasmas: Ion energies and modelling reactive ion etching

D Field, PW May, DF Klemperer, YP Song

Research output: Chapter in Book/Report/Conference proceeding › Chapter in a book

Translated title of the contribution	RF plasmas: Ion energies and modelling reactive ion etching
Original language	English
Title of host publication	Plasma Chemistry Sources and Diagnostics, Colloquium Digest
Publisher	Institution of Engineering and Technology (IET)
Pages	1 - 3
Number of pages	2
Volume	090
Publication status	Published - 1991

Other: # pages 5/1-5/3

Handle.net

@inbook{4ed9ca168da0422e8e862104af5a57a2,

title = "RF plasmas: Ion energies and modelling reactive ion etching",

author = "D Field and PW May and DF Klemperer and YP Song",

note = "Other: # pages 5/1-5/3",

year = "1991",

language = "English",

volume = "090",

pages = "1 -- 3",

booktitle = "Plasma Chemistry Sources and Diagnostics, Colloquium Digest",

publisher = "Institution of Engineering and Technology (IET)",

address = "United Kingdom",

}