Simulation of sidewall profiles in reactive ion etching

Research output: Chapter in Book/Report/Conference proceeding › Conference Contribution (Conference Proceeding)

Translated title of the contribution	Simulation of sidewall profiles in reactive ion etching
Original language	English
Title of host publication	Unknown
Volume	733
Publication status	Published - 1993

Conference Proceedings/Title of Journal: 3rd Int Symp on Proc. Physics and Modeling in Semicond. Technol

Research Groups and Themes

@inproceedings{462c63f1714249eebce0e794a25c7276,

title = "Simulation of sidewall profiles in reactive ion etching",

author = "IM Hedgecock and PW May and D Field and DF Klemperer",

note = "Conference Proceedings/Title of Journal: 3rd Int Symp on Proc. Physics and Modeling in Semicond. Technol",

year = "1993",

language = "English",

isbn = "156670602",

volume = "733",

booktitle = "Unknown",

}