Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of Microwave plasma and Hot Filament CVD reactors

PW May, JN Harvey, NL Allan, JC Richley, YA Mankelevich

Research output: Contribution to journalArticle (Academic Journal)

18 Citations (Scopus)
Translated title of the contributionSimulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of Microwave plasma and Hot Filament CVD reactors
Original languageEnglish
Pages (from-to)114909:1 - 14
JournalJournal of Applied Physics
Volume108
DOIs
Publication statusPublished - 2010

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