Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of Microwave plasma and Hot Filament CVD reactors

PW May; JN Harvey; NL Allan; JC Richley; YA Mankelevich

doi:10.1063/1.3516498

Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of Microwave plasma and Hot Filament CVD reactors

PW May, JN Harvey, NL Allan, JC Richley, YA Mankelevich

Research output: Contribution to journal › Article (Academic Journal) › peer-review

20 Citations (Scopus)

Translated title of the contribution	Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of Microwave plasma and Hot Filament CVD reactors
Original language	English
Pages (from-to)	114909:1 - 14
Journal	Journal of Applied Physics
Volume	108
DOIs	https://doi.org/10.1063/1.3516498
Publication status	Published - 2010

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Experiment and modelling of the growth of CVD diamond: towards a detailed understanding of growth chemistry and mechanisms
May, P. W.
1/10/10 → 1/04/14
Project: Research

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@article{9b0afb4ad52747b78e62e1645eca23bf,

title = "Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of Microwave plasma and Hot Filament CVD reactors",

author = "PW May and JN Harvey and NL Allan and JC Richley and YA Mankelevich",

year = "2010",

doi = "10.1063/1.3516498",

language = "English",

volume = "108",

pages = "114909:1 -- 14",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics (AIP)",

}

TY - JOUR

T1 - Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of Microwave plasma and Hot Filament CVD reactors

AU - May, PW

AU - Harvey, JN

AU - Allan, NL

AU - Richley, JC

AU - Mankelevich, YA

PY - 2010

Y1 - 2010

U2 - 10.1063/1.3516498

DO - 10.1063/1.3516498

M3 - Article (Academic Journal)

VL - 108

SP - 114909:1 - 14

JO - Journal of Applied Physics

JF - Journal of Applied Physics

SN - 0021-8979

ER -

Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of Microwave plasma and Hot Filament CVD reactors

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Projects

Experiment and modelling of the growth of CVD diamond: towards a detailed understanding of growth chemistry and mechanisms

Cite this